2013年11月28日星期四

Passives Products Tantalums get more reliable

Passives Products Tantalums get more reliable

2013/11/28

04dec13Kemet 453Kemet is claiming “the industry’s best reliability and highest breakdown voltages” from solid tantalum capacitors as a result of two technology developments.

One is a collection of manufacturing changes, branded F-Tech. It “features techniques for optimising chemical purity to eliminate hidden dielectric defects that could continue to grow in the field, leading to capacitor failure,” said Kemet. It “is an approach to anode manufacturing based on a fundamental understanding of degradation mechanisms in tantalum capacitors. Some of the processes minimise an anode’s carbon and oxygen content as these elements can become contaminants that lead to crystallisation of the anodic oxide dielectric. Another process technology enhances reliability by ensuring a stronger mechanical connection between the tantalum lead wire and the anode.”

The second development is ‘simulated breakdown screening’, branded SBDS, which is a non-destructive testing technique that simulates capacitor breakdown voltage without damaging the capacitor, which can be applied to 100% of product, claims the firm.

“Traditional dc leakage tests cannot detect small defects in the dielectric and performing these tests at accelerated conditions can actually induce more defects,” it said. “Simulated breakdown screening allows Kemet to provide customers with only the most reliable capacitors from a given lot.”

“Based on feedback from a third party, if you used 1,000,000 tantalum capacitors of this class, other solutions would have their first failure in approximately six months to one year, and our first failure would occur in 10,000 years, said Kemet CEO Per Loof.

Following Loof’s statement, the company added: “This does not constitute a warranty and is based on feedback from a third party with a mean failure rate of 0.0000036ppmh as compared to typical performance of tantalum capacitors in this class of 0.34 to 0.67ppmh.”



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